Canon Litho Tool Years From Commercial Use, Analysts Say
[ad_1] //php echo do_shortcode(‘[responsivevoice_button voice=”US English Male” buttontext=”Listen to Post”]’) ?> Canon’s new nanoprint lithography tool will take years to rival the EUV equipment that ASML alone provides to make the world’s most advanced semiconductors, analysts told EE Times. Canon last week began promoting its FPA-1200NZ2C nanoimprint tool that stamps a mask with a circuit…
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