EUV Alternative Speeds Up Chip Production
[ad_1] //php echo do_shortcode(‘[responsivevoice_button voice=”US English Male” buttontext=”Listen to Post”]’) ?> Applied Materials has introduced its new Centura Sculpta pattern-shaping system that promises to provide a cost-effective alternative to extreme ultraviolet (EUV) lithography double patterning used to print dense interconnect lines and vias. As a result, the solution can reduce the number of EUV steps,…
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